Fine Pattern Fabrication by Nano Imprint Lithography
نویسندگان
چکیده
منابع مشابه
Imprint lithography for integrated circuit fabrication
The escalating cost for next generation lithography ~NGL! tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, a prohibitive number for many companies. As a result, several researchers are looking at low cost alternative methods for printing sub-100 nm features. In the mid-1990’s, several research groups star...
متن کامل3D Simulation of Nano-Imprint Lithography
A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwa...
متن کاملFabrication of Three-Dimensional Imprint Lithography Templates by Colloidal Dispersions
Fabrication of Three-Dimensional Imprint Lithography Templates by Colloidal Dispersions A. Marcia Almanza-Workman, Taussig P. Carl, Albert H. Jeans, Robert L. Cobene HP Laboratories HPL-2011-32 Flexible displays, Self aligned imprint lithography, stamps, fluorothermoplastics, latex Self-aligned imprint lithography (SAIL) enables patterning and alignment of submicron-sized features on flexible...
متن کاملHigh-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography
We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum values for (0002) and (102) reflections are 171 and 205 arcsec, respectively. The optimized NPSS con...
متن کاملIn-situ monitoring of pattern filling in nano-imprint lithography using surface plasmon resonance.
Nano-imprint lithography possesses the advantages of high throughput, sub-10-nm feature and low cost. In NIL, the mold filling is subjected to the applied imprinting pressure, temperature and time. Incomplete mold filling causes a detrimental effect on the final imprinted pattern dimensions. The monitoring system of imprinting is essential to control the imprinting parameters properly. Up to no...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Kobunshi
سال: 2003
ISSN: 0454-1138,2185-9825
DOI: 10.1295/kobunshi.52.568